Photoresist coating
| Equipment summary: | |
|---|---|
| Application range: | Applicable substrate size: 2"-6" Round Wafer substrate. |
| Basic specifications: | |
| Appearance material: | The body is made of SUS 304 bright surface quality combination. |
| Equipment skeleton: | The lacquered frame is combined, and the structure is firm. |
| Basin cover: | PP Cup three-piece basin cover structure. |
| Suction cup: | The aluminum suction cup is anodically hardened, which has the function of anti-acid, and the surface of the suction cup is flat. |
| Exhaust system: | The three-piece basin cover indirect ventilation design effectively stabilizes the air turbulence, and at the same time reduces peculiar smells to avoid residual photoresist on the back. |
| Drainage system. | |
| Motor: | AC Servo Motor (speed: 10-6000 RPM) |
| Vacuum pump: | Oil-free medium-sized vacuum pressure pump. |
| Machine safety protection. | |
| Electric control system: | |
| Software: | PLC programmable automation controller. |
| Use the operation interface: | Colour Touch Screen, PLC interface integrates HMI. |
| Recipe module and number of segments setting: | 100 groups of formulas, each formula has 30 segments. |
| Password setting: | Password protection can be set according to authority. |
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